Abstract: In recent years, the monolithic integration of III/V-semiconductor materials and heterostructures on CMOS-compatible (001) Si-substrate is gaining increasing interest for the realization of novel integrated circuits with improved electronic, optoelectronic or photonic functionalities. The principal challenges of the III/V-material integration on CMOS-compatible (001) Si-substrates will be reviewed and possible solutions for the high-quality deposition of III/V-layer stacks will be demonstrated for large area 300 mm (001) Si-wafers by applying low-temperature metal organic vapor phase epitaxy (MOVPE) processes. Examples of successfully developed technologies including defect-free GaP-on-Si-template wafers as well as novel lattice-matched Ga(NAsP)-based laser stacks for Si-photonics applications will be presented and discussed.
Bio: Wolfgang Stolz is full professor and co-head of the Structure and Technology Research Laboratory (Material Sciences Center and Faculty of Physics, Philipps-University Marburg(Germany)), Adjunct Professor at the Optical Sciences Center (University of Arizona, Tucson (USA)) and Chief Technology Officer (NAsP III/V GmbH Marburg (Germany)). His current fields of activities include the epitaxial growth for a wide range of III/V-compound semiconductor material systems and heterostructure by applying metal organic vapor phase epitaxy (MOVPE) as well as a realization of novel device concepts for electronic, solar cell and laser applications in particular also integrated on CMOS-compatible (001) Si-substrates.